Iridium oxide film for electrochromic device
US5520851A · kind A · utility
24Cited by
23References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 14, 1994 |
| Grant date | May 28, 1996 |
| Priority date | — |
| Expiry date | Nov 14, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/29
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of depositing a nitrogen-containing electrochromic iridium oxide film by sputtering iridium in an atmosphere comprising oxygen and nitrogen is disclosed for use in producing a transparent electrochromic article. The article includes electroconductive films, e.g., ITO, on two substrates, one of which has a superimposed electrochromic film, e.g., tungsten oxide, and the other of which has superimposed the iridium oxide film of the invention. An ion conductive layer between the electrochromic films completes the article.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.