Low irritant skin-cosmetic composition for daily topical use, its application and manufacture
US5520918A · kind A · utility
117Cited by
6References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 15, 1994 |
| Grant date | May 28, 1996 |
| Priority date | — |
| Expiry date | Mar 15, 2014 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61K2800/75
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
A skin-conditioning composition is disclosed which can be applied topically to improve skin cell renewal rates with low irritation levels and comprises minor proportions of a salicylic acid and a somewhat hydrophobic alpha hydroxy aliphatic acid formulated into an acidic cosmetic composition, optionally with an anti-irritant or anti-oxidant additive. Preferred acids are salicylic and lactic and appropriate compositions are also useful topical treatments for the scalp to reduce hair loss.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.