Smooth surface CVD diamond films and method for producing same
US5523121A · kind A · utility
126Cited by
8References
8Claims
0Family size
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Key dates
| Filing date | Mar 31, 1994 |
| Grant date | Jun 4, 1996 |
| Priority date | — |
| Expiry date | Mar 31, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Chemical vapor deposition method for producing a fine grained smooth growth surfaced diamond film on a substrate employs a hydrogen/hydrocarbon gaseous atmosphere containing an amount of nitrogen effective to inhibit the growth of the diamond grains deposited on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.