Process for producing a silicon oxide deposit on the surface of a metallic or metallized polymer substrate using corona discharge at pressures up to approximately atmospheric

US5523124A · kind A · utility

Assignee

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

• Frank Slootman · Cosne-Cours-sur-Loire, FR
• Pascal Bouard · Draveil, FR

Key dates

• Filing date: Mar 10, 1995
• Grant date: Jun 4, 1996
• Expiry date: Mar 10, 2015

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/503
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process for producing a silicon oxide deposit at the surface of a metallic substrate comprising the following steps performed either concomitantly or successively: (1) treating the surface of the substrate with a corona discharge; and (2) exposing the surface to an atmosphere containing a silicon compound in the gaseous state. Both steps (1) and (2) are conducted at a pressure greater than 10,000 Pa. This process can be used to provide anti-corrosion treatment to a metallic substrate or to a metallized polymeric support.