Cylindrical magnetron shield structure
US5527439A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 23, 1995 |
| Grant date | Jun 18, 1996 |
| Priority date | — |
| Expiry date | Jan 23, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An improved shield structure for use in a sputtering apparatus for depositing a film on a substrate is disclosed. The cylindrically shaped shield structure, which extends over the ends of a cylindrical sputtering target, has at least one annular structure extending around an outside surface of the shield. The annular structure is dimensioned to interrupt or suppress movement of any arc which might otherwise travel across its outside surface. In a preferred embodiment, the annular structure is a groove capable of trapping any such arc therein and preventing its escape therefrom. In another preferred embodiment, the improved shield structure is electrically isolated such that it is prevented from becoming an anode. In this manner, the electrically isolated shield structure inhibits the formation of severe arcs between it and the cathodic target. Further, with its arc-suppressing annular structure, the electrically isolated shield structure inhibits movement of any such severe arcs which might otherwise travel across the shield surface toward the support blocks, the vacuum chamber or other anode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.