Patent · US Expired

Magnetooptic layer and a process for its fabrication

US5527605A · kind A · utility

10Cited by

5References

38Claims

0Family size

Assignee

Hoechst GmbH · DE

Inventors

Karl-Friedrich Doessel · Wiesbaden, DE
Bernd Fischer · Bräunlingen, DE
Ernst-Gunther Schlosser · Kelkheim, DE
Guenther Schmidt · Tauberbischofsheim, DE

Key dates

Filing date	Apr 7, 1994
Grant date	Jun 18, 1996
Priority date	—
Expiry date	Apr 7, 2014

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/265
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A magnetooptic layer made from rare-earth metals and transition metals exhibits a gradient in the alloy composition over the layer depth, and has a coercive field strength of more than 8 kOe in the temperature range of .DELTA.T=100.degree. C. around the compensation temperature T.sub.comp. The layer is fabricated with a dynamic sputter process, in which the substrates to be coated are led past one or a plurality of sputter targets, arranged in a common plane parallel to the track of the substrates. A mask is located between the sputter targets and the substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.