Method and apparatus for evaluating thin-film multilayer structure
US5530732A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 19, 1995 |
| Grant date | Jun 25, 1996 |
| Priority date | — |
| Expiry date | May 19, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of determining the compositions and thicknesses of metamorphic layers at heterointerfaces of periodic laminated structures, such as multiple quantum well structures. An X-ray diffraction pattern of the actual structure is measured and a theoretical X-ray diffraction pattern is calculated using dynamic X-ray theory and giving special attention to X-ray diffraction fringes near a satellite peak in the pattern. The thicknesses and compositions of the metamorphic layers are adjusted in a recursive analysis until the calculated pattern agrees with the measured pattern, thereby providing an accurate analysis of laminated periodic structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.