Integrated laser ablation deposition system
US5534071A · kind A · utility
15Cited by
10References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 1994 |
| Grant date | Jul 9, 1996 |
| Priority date | — |
| Expiry date | May 10, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/684
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A laser ablation deposition system includes a movable platform for supporting ferroelectric target material and a support structure for supporting a thermally sensitive semiconductor substrate within a chamber mounted on a moveable cabinet, and a laser for ablating the material mounted on a support frame along with various control components. The cabinet with the chamber may be moved away from the laser and support frame to allow the chamber to be raised to provide access to the components within the chamber. The system may be used to fabricate a multilayer thin film device using multicomponent oxides.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.