Acetal polymers useful in photosensitive compositions
US5534381A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 1995 |
| Grant date | Jul 9, 1996 |
| Priority date | — |
| Expiry date | Jul 6, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F8/48
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
This invention is an acetal polymer having the following repeating units: ##STR1## where R is an alkyl group of 1 to 10 carbon atoms; PA1 Ar.sub.1 is an aromatic group substituted with an aliphatic group containing 3 to 20 carbon atoms or an alkoxy group having 3 to 20 carbon atoms; PA1 Ar.sub.2 is a non-substituted aromatic group; PA1 A.sub.1 is an acid group; PA1 n.sub.1, n.sub.2, n.sub.3, n.sub.4, n.sub.5 represent the molar percents of the respective repeating units and n.sub.1 is 0-20 mole %, preferably 2-10 mole %; n.sub.2 is 2-20 mole %, preferably 5 to 15 mole %; n.sub.3 is 15-85 mole %, preferably 20 to 65 mole %; n.sub.4 is 0 to 40 mole %, preferably 0 to 20 mole %; and n.sub.5 is 5-40 mole %, preferably 20 to 35 mole %. These polymers may be used in photosensitive compositions and lithographic printing plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.