Process for preparing a polyunsaturated diazonium compounds
US5534623A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 1995 |
| Grant date | Jul 9, 1996 |
| Priority date | — |
| Expiry date | May 30, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D175/16
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula EQU (A.sup.- N.sub.2.sup.+).sub.p --Ar--(R).sub.q --(XH).sub.r with a polyethylenically unsaturated monoisocyanate compound of the general formula ##STR1## where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divalent or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A.sup.- represents an anion; Z represents the residue of a polyisocyanate OCN--Z--(NCO).sub.n where n is 1 or 2; and Y is the residue of a monohydroxy compound of the formula YOH where Y contains at least two ethylenically unsaturated double bonds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.