Method and system for inspecting polished surface texture
US5535005A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 1994 |
| Grant date | Jul 9, 1996 |
| Priority date | — |
| Expiry date | Aug 25, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/303
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for obtaining texture measurements of a highly-polished surface (110) uses a directed-energy light source (124) to perform the steps of scattering the directed-energy light from a plurality of known texture surfaces. The known texture surfaces have equivalent surface area and dimensions to those of the highly-polished surface (110). A next step is to measure (102 and 130) the scattered light from the directed-energy light source (124) to establish a threshold energy level measurement (48, 50, or 52) above which the measured scattered light varies according to differences in texture among the plurality of known texture surfaces. From variations in the measured scattered light a texture-light relationship (Equation 1) is established that expresses expected changes in measured scattered light according to changes in texture in the plurality of known texture surfaces. Scattered light from the highly-polished surface (110) is then measured. A texture measurement is then generated by applying the texture-light relationship (Equation 1) to the measured scattered light from the highly-polished surface (110).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.