Photographic elements with improved cinch scratch resistance
US5536627A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 21, 1995 |
| Grant date | Jul 16, 1996 |
| Priority date | — |
| Expiry date | Mar 21, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/161
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photographic element comprising a support having a front side and a back side, an image forming layer on the front side of the support, a protective overcoat on the front side of the Support further removed from the support than the image forming layer, the protective overcoat comprising process surviving matte particles in a hydrophilic binder, the matte particles having a Rockwell hardness of less than M90, the back side of the support having a protective overcoat layer, the protective overcoat layer being the layer furthest removed from the back side of the support and comprising a hydrophobic material having a Delta haze less than 30%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.