An interferometric measuring system having temperature compensation and improved optical configurations
US5537209A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 13, 1995 |
| Grant date | Jul 16, 1996 |
| Priority date | — |
| Expiry date | Jan 13, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/70
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved interferometric measuring system wherein the system projects a first beam of light at a first measurement wavelength along a reference path to a reference reflector and a second beam of light at a second measurement wavelength along a measurement path to a measurement reflector, and determines a change in position of the measurement reflector from an interference pattern produced between a first light beam reflected from the reference reflector and a second light beam reflected from the measurement reflector, and wherein the system can measure atmospheric disturbances along the measurement path, concurrently with measuring a change in the position of the measurement reflector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.