Patent · US Expired

Cathodic sputtering system

US5538609A · kind A · utility

7Cited by

3References

2Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Reiner Hinterschuster · Hammersbach, DE
Berthold Ocker · Hanau, DE
Roland Gesche · Seligenstadt, DE
Mark Saunders · Naperville, US

Key dates

Filing date	May 24, 1995
Grant date	Jul 23, 1996
Priority date	—
Expiry date	May 24, 2015

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3408
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An evacuable chamber serving as a cathode contains a rotatable magnet system and is connected to a high frequency power supply for sputtering a target. The chamber is electrically isolated from an evacuable housing containing the substrate to be coated, the chamber being covered by a cup-like shield fixed to the housing to define an interior space. A pipe for evacuating the chamber includes first and second sections separated by a gap and connected by an electrically insulating collar in which parallel metal grids are installed in the gap and respectively connected to the power source and to ground in order to prevent the formation of secondary plasma.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.