Patent · US Expired

Method of manufacturing a tip for scanning tunneling microscope using peeling layer

US5546375A · kind A · utility

64Cited by
8References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 8, 1995
Grant dateAug 13, 1996
Priority date
Expiry dateNov 8, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/888
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

After a recessed portion 2 is formed in a first substrate made of single crystal silicon by crystal axis anisotropic etching, a peeling layer and a material of a fine tip which may be a noble metal or a noble metal alloy are formed. A second substrate is joined to the fine tip, and peeling is performed on the peeling layer, whereby the fine tip is formed on the second substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.