Automated mask alignment for UV projection expose system
US5552891A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 31, 1994 |
| Grant date | Sep 3, 1996 |
| Priority date | — |
| Expiry date | Oct 31, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for aligning an image on a substrate support. A substrate support supports a substrate to be treated by radiation. At least one radiation source produces desired wavelengths of radiation to treat the substrate. The radiation is directed toward the substrate support. At least one filter filters selected wavelengths of the radiation. The filter is positioned between the substrate support and the radiation source. A mask selectively transmits the radiation. The mask is positioned between the radiation source and the substrate support. At least one detector detects a position of radiation impinging upon the substrate support and produces a signal corresponding to the sensed position. The detected position is compared with a desired position of radiation impinging upon the substrate support. The detected position is compared to the desired position and a signal is produced corresponding to the comparison. A positioner positions the substrate support in a desired position for treating the substrate. The positioning means receives the signal from the comparing means and alters, when necessary, in a direction parallel to a surface of a substrate supported by the substrate supp…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.