Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities

US5554220A · kind A · utility

Assignee

• THE TRUSTEES OF PRINCETON UNIVERSITY · US

Inventors

• Stephen R. Forrest · Ann Arbor, US
• Vladimir Sinisa Ban · Princeton, US
• Paul E. Burrows · Chattaroy, US
• Jeffrey Schwartz · Princeton, US

Key dates

• Filing date: May 19, 1995
• Grant date: Sep 10, 1996
• Expiry date: May 19, 2015

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C30B29/54
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In a method using organic vapor phase deposition (OCPD), for the growth of thin films of optically nonlinear organic salts, a volatile precursor of each component of the salt is carried as a vapor to a hot-wall reaction chamber by independently controlled streams of carrier gas. The components react to form a polycrystalline thin film on substrates of glass and gold. Excess reactants and reaction products are purged from the system by the carrier gas. For example, the method provides the growth of polycrystalline, optically nonlinear thin films of 4'-dimethylamino-N-methyl-4-stilbazolium tosylate (DAST) with >95% purity.