Photoresist stripping composition
US5554312A · kind A · utility
33Cited by
3References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 13, 1995 |
| Grant date | Sep 10, 1996 |
| Priority date | — |
| Expiry date | Jan 13, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D7/34
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A non-aqueous photoresist stripping composition for effectively preventing the redeposition of alkali metal ions, particularly sodium and potassium ions, on a substrate during the stripping operation is disclosed. The stripping composition comprises: PA1 (a) an organic polar solvent; PA1 (b) an organic aliphatic or aromatic amine, or an organic amino alcohol; and PA1 (c) either polyethylene glycol or polypropylene glycol in an amount to provide a caging effect. The composition also preferably includes a biodegradable organic solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.