System and method for scene light source analysis
US5555085A · kind A · utility
11Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 1995 |
| Grant date | Sep 10, 1996 |
| Priority date | — |
| Expiry date | Feb 22, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2003/467
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
System and method for rapid measurement of an exposure light source and calculation of filter selection for proper color balanced exposure of a light sensitive medium includes measurement of the light source with a spectroradiometer and calculation of color log exposure differences for successive filters taken from a database list with the filter selection being based on a minimum overall difference value derived from the summation of the absolute values of the individual color log exposure differences.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.