Method of stripping photoresist with composition containing inhibitor
US5556482A · kind A · utility
41Cited by
17References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 1995 |
| Grant date | Sep 17, 1996 |
| Priority date | — |
| Expiry date | Jul 11, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23G1/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.