Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate
US5556734A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1994 |
| Grant date | Sep 17, 1996 |
| Priority date | — |
| Expiry date | Dec 23, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensitive resin composition which comprises (A) a copolymer represented by the following general formula and (B) a radiation sensitive acid generator and, if necessary, (C) an alkali-soluble resin: ##STR1## wherein R represents a hydrogen atom or a methyl group and m and n are integers representing the numbers of the respective recurring units and satisfying the relations 0.1.gtoreq.m/(m+n)<0.6 and 0.4<n/(m+n).ltoreq.0.9. Said radiation sensitive resin composition is excellent in resolution and pattern profile and also excellent in sensitivity and developability and is useful as a chemically amplified resist good in contrast and heat resistance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.