Polysilane-based composition
US5556901A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 2, 1993 |
| Grant date | Sep 17, 1996 |
| Priority date | — |
| Expiry date | Nov 2, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K5/005
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The subject-matter of the present invention is to solve the technical problem resulting from the instability in air of polysilanes. For this purpose, it proposes a polysilane-based composition, used particularly for producing silicon carbide, comprising: PA1 polysilane chains capable of being degraded by oxidation and the formation of polysiloxane-type products and/or polysilane chains suitable for being bound together directly by a reaction between Si--H and Si--X radicals, and/or indirectly through the intermediary of a crosslinking additive and by a reaction between A--X and A--H radicals, X being an olefin radical, preferably comprising 1 to 18 carbon atoms and, more preferably still, being constituted by a vinyl radical (Vi:--CH.dbd.CH.sub.2), A being an organic, organosilicic or silicic radical; PA1 and at least one antioxidant system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.