Patterned mirror VCSEL with adjustable selective etch region
US5557626A · kind A · utility
56Cited by
5References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 15, 1994 |
| Grant date | Sep 17, 1996 |
| Priority date | — |
| Expiry date | Jun 15, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/209
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Patterned-mirrors for VCSELs are fabricated by forming a first mirror stack of a plurality of pairs of relatively high and low index of refraction layers, forming an active region of aluminum-free material on the first mirror stack, and forming a second mirror stack of a plurality of pairs of relatively high and low index of refraction layers. The second mirror stack includes first and second portions of materials selected to provide different rates of etching between the first and second portions. The second portion is selectively etched to the first portion by utilizing the first portion as an etch stop.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.