Positive-working radiation-sensitive mixture and the production of relief patterns

US5563022A · kind A · utility

Assignee

• BASF SE

Inventors

• Horst Binder · Lampertheim, DE
• Reinhold Schwalm · Monsheim, DE
• Dirk Funhoff · Heidelberg, DE

Key dates

• Filing date: Oct 29, 1992
• Grant date: Oct 8, 1996
• Expiry date: Oct 29, 2012

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/122
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A positive-working UV-sensitive mixture containing (a1) an organic binder containing acid-labile ether, ester or carbonate groups or (a2) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, or PA1 (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a group which forms an acid under the action of radiation, or a mixture of the organic compounds (a2.1) and (a2.2) and (b) an arylsulfonic ester, is suitable for the production of relief patterns.