Exposing apparatus with mask alignment system and method of aligning, exposing and transferring work
US5563682A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 1995 |
| Grant date | Oct 8, 1996 |
| Priority date | — |
| Expiry date | Apr 27, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an exposing apparatus including an alignment stage A, an exposing stage B, transferring mechanisms 10 and 11 provided in the alignment stage and the exposing stage, a light source device 9, and an image-taking device for taking the images of the work W from the top of the work, the exposing apparatus further including a retaining mechanism for holding a mask film M from the top of the mask film, the retaining mechanism comprising a suction unit 5a for sucking the mask film, a supporting arm 17 for supporting the suction unit so as to be movable up and down, a first driving device 14 for moving the supporting arm up and down, a second driving device vice 15 for moving the first driving device up and down, and a stopper supporting unit 20 for fixing and supporting the suction unit at a predetermined position of the suction unit, so that this apparatus occupies a small space, and the work is accurately aligned with the mask film, and the upper and lower frames do not need to be opened and closed in the alignment stage, and the positional deviation of the work and the mask film does not occur, and the causes of deteriorating a coherent film of an optical system in early stage is dec…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.