Aliasing sampler for plasma probe detection
US5565737A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 7, 1995 |
| Grant date | Oct 15, 1996 |
| Priority date | — |
| Expiry date | Jun 7, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/0081
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An aliasing sampler probe for detecting plasma RF voltage and current employs a sampling signal with a sampling rate slower that the RF fundamental frequency selected to produce an aliasing waveform at an aliasing frequency that is several orders of magnitude below the RF fundamental frequency. In one embodiment, the RF power is applied at 13.56 MHz. and sampling pulses have a sampling rate of 2.732 MHz to produce replicas of the RF voltage and current waveforms at an aliasing frequency of about 100 KHz. The aliasing replicas preserve phase and harmonic information with an accuracy that is not available from other sampling techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.