Scanning exposure slit for a shuttle style film gate
US5565960A · kind A · utility
1Cited by
5References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 14, 1994 |
| Grant date | Oct 15, 1996 |
| Priority date | — |
| Expiry date | Oct 14, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/525
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure slit is provided for a shuttle style film gate in a film transport. The exposure slit is provided on a plate that is mounted to the film gate shuttle. After the shuttle advances a frame of the film, it carries the slit with it during its return to a home position. Exposure of the film frame is made through the slit during the return travel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.