Apparatus for depositing diamond coating in reactor equipped with a bowl-shaped substrate
US5567242A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 4, 1995 |
| Grant date | Oct 22, 1996 |
| Priority date | — |
| Expiry date | Oct 4, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for coating components such as cutting tools with diamond using a microwave plasma excited gas mixture in a reactor equipped with a bowl-shaped substrate table having a concave inner surface for supporting the components to be coated. The plasma forms a plasma ball during the coating operation and the geometrical shape, configuration and position of the table is adapted to stabilize the plasma and control the shape and position of the plasma in such a way that the outer surface of the plasma conforms substantially to the surfaces of the components to be coated. The table can include a system of channels for optimized gas flow and metallic or ceramic wires or rods to control the shape and position of the plasma as well as yield additional excitation of the gas mixture. The table can include an upper rim which facilitates coupling of the plasma directly to the table. The table can include ledges, rods, compartments and/or holes for supporting the components to be coated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.