Method and apparatus utilizing an optical stage for topographic surface analysis
US5568256A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 21, 1994 |
| Grant date | Oct 22, 1996 |
| Priority date | — |
| Expiry date | Apr 21, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B9/025
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for topographic surface analysis including at least ne light source for radiating light, a first light-distributing surface of a first diffraction grating for receiving light from the at least one light source and for reflecting a first bundle of light under normal optical conditions and a second bundle of light formed by diffraction of the first order. A first optical stage is provided for projecting the first and second bundles from the first light-distributing surface in an optically conjugated form onto an object surface to be analyzed of a sample. Light representing the object surface is sharply projected via the first optical stage onto a second light-distributing surface of a second diffraction grating. A second optical stage projects diffracted bundles of light from the second light-distributing surface onto a detector which detects radiation and enables topographic analysis of the object surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.