Patent · US Expired

Method and apparatus utilizing an optical stage for topographic surface analysis

US5568256A · kind A · utility

38Cited by
0References
29Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 21, 1994
Grant dateOct 22, 1996
Priority date
Expiry dateApr 21, 2014

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B9/025
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and apparatus for topographic surface analysis including at least ne light source for radiating light, a first light-distributing surface of a first diffraction grating for receiving light from the at least one light source and for reflecting a first bundle of light under normal optical conditions and a second bundle of light formed by diffraction of the first order. A first optical stage is provided for projecting the first and second bundles from the first light-distributing surface in an optically conjugated form onto an object surface to be analyzed of a sample. Light representing the object surface is sharply projected via the first optical stage onto a second light-distributing surface of a second diffraction grating. A second optical stage projects diffracted bundles of light from the second light-distributing surface onto a detector which detects radiation and enables topographic analysis of the object surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.