Automated mask alignment for UV projection exposure system
US5569570A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 13, 1995 |
| Grant date | Oct 29, 1996 |
| Priority date | — |
| Expiry date | Apr 13, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of aligning an image at a desired position on a substrate support including providing a radiation source producing desired wavelengths of radiation. A fluorescing medium is provided on a substrate support. The radiation is directed toward the substrate support. At least one filter is positioned between the radiation source and the substrate support. A mask is positioned between the radiation source and the substrate support. The mask selectively transmits the radiation. The substrate support is irradiated with the radiation, thereby causing the fluorescing medium to fluoresce. A position of the radiation impacting upon the substrate support is detected with at least one detector by detecting an image of the fluorescing medium. A signal corresponding to the detected position of the radiation is produced. The detected position of the radiation is compared with a desired position of radiation impinging upon the substrate support to determine whether a deviation of the position of the radiation on the substrate support away from a desired position in a direction perpendicular to the radiation exists. A signal corresponding to comparison is produced. If a deviation exists, the …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.