Sulfonium salt and resist composition
US5569784A · kind A · utility
20Cited by
0References
24Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 27, 1995 |
| Grant date | Oct 29, 1996 |
| Priority date | — |
| Expiry date | Jan 27, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel sulfonium salt having at least one substituted aromatic group having acid labile groups and at least one nitrogenous aromatic group is provided. A chemically amplified, positive resist composition comprising the sulfonium salt as well as an alkali soluble resin and a dissolution inhibitor in an organic solvent has solved the PED problem.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.