Distortionless x-ray inspection
US5570407A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1994 |
| Grant date | Oct 29, 1996 |
| Priority date | — |
| Expiry date | Jun 30, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/04
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The cavities of IC's are inspected for contaminants rising a point source x-ray. The IC's are arranged on a curved surface, approximating the arc formed by the radiation from the point source x-ray. In this way, the IC's may be stood on end with the sides parallel to the x-ray radiation. In this arrangement, the radiation from the x-ray point source passes approximately parallel to the IC size and a clear image of the cavity is achieved without distortion produced by the x-rays passing thou the bottom or the top. Alternately, the curved surface for mounting the IC's may be formed of small straight sections formed at angles approximating the curve.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.