Process for adjusting the sensitivity to radiation of photopolymerizable compositions
US5573889A · kind A · utility
48Cited by
21References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 1995 |
| Grant date | Nov 12, 1996 |
| Priority date | — |
| Expiry date | May 9, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/029
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A process is described for the preparation of photopolymerizable compositions, wherein the photopolymerizable compositions can be photopolymerized by the irradiation of emission lines of differing wavelength from a UV/VIS laser light source, and contain a photopolymerizable compound and at least two photoinitiators, by adjusting the sensitivity to radiation. The ratio between the concentrations of the individual photoinitiators is so adjusted that the composition has virtually the same optical density for the radiation of the different emission lines at which the photoinitiators are effective.
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