Polymers comprising both polyamide-diacid/polyetherdiol blocks and polyamide-diacid/polyetherdiamine blocks, and their preparation
US5574128A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 1994 |
| Grant date | Nov 12, 1996 |
| Priority date | — |
| Expiry date | Aug 10, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S525/927
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Polyetheresteramides, characterized in that they comprise both of the following repeating entities: ##STR1## in which X represents the residue of a polyamide-diacid oligomer with an Mn of between 300 and 8000, Y represents the residue of a polyetherdiol with an Mn of between 200 and 5000, and Z represents the residue of a polyetherdiamine with an Mn of between 200 and 5000, wherein the proportion by mass of the entities Z resulting from the condensation of the polyetherdiamine with respect to the total amount of the entities resulting from the polyetherdiol and polyetherdiamine, i.e. Z/(Z+Y), is between 1 and 50%. The polyetheresteramides according to the invention can be used as is and are suitable for the production of mouldings, extrudates, films, sheaths, or composite materials such as multi-layer film. They can also be mixed with other polymers and in particular with polyamides. Additives such as heat stabilizers, antioxidizing agents, dyes, inorganic fillers, or various organics can also be added to them.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.