Stage mechanism in exposure apparatus
US5574556A · kind A · utility
15Cited by
13References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1996 |
| Grant date | Nov 12, 1996 |
| Priority date | — |
| Expiry date | Mar 25, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70716
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A stage mechanism suitable used in an exposure apparatus is disclosed, wherein heat generation of a coil assembly of a stage driving motor is prevented from adversely affecting a semiconductor substrate or measurement by a laser interferometer. A wafer chuck and the laser interferometer are disposed at a side of a base plate, and a stage and an electromagnetic coil for dirving the stage are disposed at the other side of the base plate. The wafer chuck and the stage are coupled to each other by a coupling member which extends through a bore formed in the base plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.