Process for the chemical cleaning of metal components
US5575863A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1994 |
| Grant date | Nov 19, 1996 |
| Priority date | — |
| Expiry date | Jul 29, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21F9/004
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for chemical cleaning of metal components having an iron oxide deposit upon a layer of compounds having a high silica content. The process includes the step of preparing an aqueous mixture including an agent for complexing Si(OH).sub.4 and at least one compound for dissolving the high silica content layer. The dissolving compound is selected from the group consisting of insertion compounds for inserting OH or F ions in the Si(OH).sub.4 and OH-containing organic compounds. The insertion compounds including electrophilic groups and are selected from the group consisting of conjugated unsaturated systems and unsaturated N-oxide compounds. The OH-containing organic compounds are selected from the group consisting of organic compounds having at least one alcohol function, aromatic amines, soluble salts of tertiary amines, and aromatic amines causing condensation of OH radicals onto silica. The process also includes the step of contacting the metal component with the aqueous medium until the high silica content layer has been dissolved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.