Deep ultraviolet absorbent composition
US5576359A · kind A · utility
18Cited by
3References
4Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jul 11, 1994 |
| Grant date | Nov 19, 1996 |
| Priority date | — |
| Expiry date | Jul 11, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.