Water laser plasma x-ray point sources
US5577091A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 13, 1995 |
| Grant date | Nov 19, 1996 |
| Priority date | — |
| Expiry date | Jan 13, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0023
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A high repetition-rate laser plasma target source system wherein ice crystals are irradiated by a laser and lithography system. The target source system comprises in a preferred embodiment a liquid tank source and freezer means which freezes microscopic particles into crystal shapes which are projected by a nozzle jet from a high repetition rate liquid-droplet injector into the path of a flashing laser beam, which results in producing soft x-rays of approximately 11.7 nm and 13 nm. Uncollected and unshot target crystals are collected and reliquified by a heater source in order to be recycled back to the liquid tank source. Optionally an auxiliary source and detector system can be used to allow for instantaneous triggering of the laser beam. The target source system can be incorporated into well known EUV lithography systems for the production of wafer chips.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.