Method for depositing a thin layer on a substrate by laser pulse vapor deposition

US5578350A · kind A · utility

Assignee

• FRAUNHOFER-GESELSCHAFT · DE

Inventors

• Hermann Mai · Dresden, DE
• Reiner Dietsch · Dresden, DE
• Klaus Schubert · Karlsruhe, DE

Key dates

• Filing date: Jun 7, 1995
• Grant date: Nov 26, 1996
• Expiry date: Jun 7, 2015

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/28
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for depositing a thin layer on a substrate by laser pulse vapor deposition provides a substantially cylindrical target having a cylinder axis and a curved target surface. A pulsed laser beam is generated having an initial path section and an initial path section axis and is capable of producing a plasma plume from the target when the pulsed laser beam impinges on the curved target surface. A first mirror located between the target and the initial path section of the laser beam is provided having a plurality of reflective interior surfaces and a first mirror axis substantially coincident with an initial path section axis of the laser beam. The laser beam is deflected so as to impinge on the reflective interior surface of the first mirror and subsequently to be reflected and to impinge on the curved target surface by controlling a plane reflective mirror that intersects the first mirror axis and is located on a side of the first mirror opposite from the target. The plane reflective mirror is tilted at an angle to the laser beam axis and is rotatable about a rotation axis substantially coincident with the first mirror axis. The laser beam is focussed on a center of the target…