Process for forming a reflective surface
US5582863A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 8, 1994 |
| Grant date | Dec 10, 1996 |
| Priority date | — |
| Expiry date | Dec 8, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for forming a reflective surface, comprises the steps of: providing at least a part of at least one unanodized surface which has a peak-to-valley height Ra of equal to or less than 1 micron. The unanodized surface is selected from the group consisting of (1) refined aluminum with a degree of purity equal to or greater than 98.3% by weight aluminum and (2) aluminum alloys with at least one element selected from the group consisting of Si, Mg, Mn, Cu, Zn, Fe. The unanodized surface is in a form selected from the group consisting of rolled foil, rolled sheets, and rolled strips and said unanodized surface is used as a substrate. The process further includes depositing at least two layers from the gas phase on the unanodized surface, wherein the two layers include a ceramic adhesive layer from the gas phase and at least one reflecting layer from the gas phase on said adhesive layer for the reflection of radiation with wavelengths in the optical range. The reflecting layer is selected from the group consisting of aluminum, silver, gold, copper and alloys containing at least one of aluminum, silver, gold and copper.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.