Cluster beam deposition method for manufacturing thin film
US5582879A · kind A · utility
12Cited by
0References
6Claims
0Family size
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Key dates
| Filing date | Nov 4, 1994 |
| Grant date | Dec 10, 1996 |
| Priority date | — |
| Expiry date | Nov 4, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/24
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method of manufacturing a thin film, evaporated particles are generated by a vapor source and are clustered. The clustered evaporated particles are deposited onto a substrate in a vacuum atmosphere without ionizing the particles. A partial pressure of water in the vacuum atmoshpere is controlled to not more than 5.times.10.sup.-6 Torr. A temperature of the substrate is maintained to be 150.degree. C. or lower. A film according to this method has a high adhesion characteristics and a high mechanical strength without heating the substrate to a high temperature and without damaging the substrate by ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.