Process for elementary analysis by optical emission spectrometry on plasma produced by a laser in the presence of argon
US5583634A · kind A · utility
16Cited by
1References
3Claims
0Family size
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Key dates
| Filing date | Nov 10, 1994 |
| Grant date | Dec 10, 1996 |
| Priority date | — |
| Expiry date | Nov 10, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/718
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A process for simultaneously blowing a gas jet onto a sample 6 to be analyzed and subsequently focusing a laser beam 4 onto the sample so as to produce a plasma 12 on the surface of the sample. An analysis is made of the spectrum S' of the light radiation emitted by the plasma and this spectrum analysis provides the basis for determining the composition of the isotopic composition of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.