High-purity, opaque quartz glass, method for producing same and use thereof
US5585173A · kind A · utility
29Cited by
4References
17Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Oct 7, 1994 |
| Grant date | Dec 17, 1996 |
| Priority date | — |
| Expiry date | Oct 7, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2975
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The high-purity, opaque quartz glass containing 3.times.10.sup.6 -9.times.10.sup.6 of closed cells having an average size of 20-40 .mu.m per 1 cm.sup.3, a ratio of closed cells having sizes of 100 .mu.m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays (.lambda.=900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 .mu.m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730.degree.-1850.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.