Large area, surface discharge pumped, vacuum ultraviolet light source
US5585641A · kind A · utility
10Cited by
4References
10Claims
0Family size
Assignee
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Key dates
| Filing date | May 23, 1995 |
| Grant date | Dec 17, 1996 |
| Priority date | — |
| Expiry date | May 23, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Large area, surface discharge pumped, vacuum ultraviolet (VUV) light source. A contamination-free VUV light source having a 225 cm.sup.2 emission area in the 240-340 nm region of the electromagnetic spectrum with an average output power in this band of about 2 J/cm.sup.2 at a wall-plug efficiency of approximately 5% is described. Only ceramics and metal parts are employed in this surface discharge source. Because of the contamination-free, high photon energy and flux, and short pulse characteristics of the source, it is suitable for semiconductor and flat panel display material processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.