Patent · US Expired

Photosensitive material processing apparatus

US5585879A · kind A · utility

11Cited by
6References
37Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 3, 1994
Grant dateDec 17, 1996
Priority date
Expiry dateAug 3, 2014

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH04N1/121
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

In a photosensitive material processing apparatus, a photosensitive material taking on the form of a long strip is fed into a conveyance mechanism and conveyed in this form along a predetermined conveyance path. An exposure device, a reservoir section, a development processing section, and a cutter are located in the conveyance path. The exposure device carries out scanning exposing operations on the long strip of the photosensitive material and thereby forms latent images on the long strip of the photosensitive material. In the reservoir section, a looped portion for serving as a buffer for conveyance is formed in the long strip of the photosensitive material, on which the latent images have been formed. In the development processing section, development processing is carried out on the long strip of the photosensitive material, which is fed via the reservoir section. The cutter cuts the long strip of the photosensitive material, which has been subjected to the development processing, into sheets having a predetermined length.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.