Alignment method
US5585925A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 1995 |
| Grant date | Dec 17, 1996 |
| Priority date | — |
| Expiry date | Jun 1, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment method for successively aligning a plurality of alignment areas of a plurality of successively supplied substrates with predetermined reference positions, includes four processes. The first process measures the positions of the alignment areas of at least a leading one of the substrates with respect to preassigned positions of the alignment areas comprising a preassigned arrangement of the alignment areas to obtain the actual arrangement of the alignment areas. The second process determines conversion parameters, such that when the relationship between the actual arrangement of alignment areas and the preassigned arrangement of alignment areas obtained in the first process is represented by a conversion formula including the conversion parameters and a correction remainder representing the error in the actual arrangement as compared to the preassigned arrangement, the error becomes a minimum. The third process stores error data representing the amount of the error in the measured position of each of the alignment areas measured in the first process with respect to the preassigned positions of the alignment areas using the determined conversion parameters. The fourth pr…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.