Process for treating semiconductor material with an acid-containing fluid

US5587046A · kind A · utility

Assignee

• Wacker Siltronic Gesellschaft Fur Halbleitermaterialien AG · DE

Inventors

• Maximilian Stadler · Haiming, DE
• Gunter Schwab · Emmerting, DE
• Peter Romeder · Burghausen, DE
• Gabriele Trifellner · Winhöring, DE

Key dates

• Filing date: Apr 10, 1995
• Grant date: Dec 24, 1996
• Expiry date: Apr 10, 2015

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/30604
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A process for treating semiconductor material with an acid-containing fluid, has water being formed as a product of a chemical reaction. Before and/or during the treatment of the semiconductor material, phosphorus pentoxide is added to the acid-containing fluid.