Process and device for supplying gas to an analyzer of traces of impurities in a gas
US5587519A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 9, 1995 |
| Grant date | Dec 24, 1996 |
| Priority date | — |
| Expiry date | Jan 9, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/0006
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A novel process for supplying a gas to an analyzer for measuring traces of impurities in the gas is provided. The process includes the steps of supplying the analyzer with: (i) a gas to be analyzed; (ii) a pure gas; and (iii) a standardizing gas obtained by dilution of one or more impurities in the pure gas as follows: (A) dividing a flow of pure gas into a set of at least first and second bypass lines, arranged in parallel, each of the bypass lines having an entry including a calibrated restriction, the flow of pure gas into the set of bypass lines being regulated by a flow regulator placed upstream of the set, (B) charging the pure gas of the first bypass line with a predetermined quantity of at least one impurity to obtain, after dilution with the pure gas of the second bypass line, a flow of the standardizing gas, which is directed from an exit of the set of bypass lines towards the analyzer along a feed line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.