Method of depositing chromium and silicon on a metal to form a diffusion coating
US5589220A · kind A · utility
9Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1995 |
| Grant date | Dec 31, 1996 |
| Priority date | — |
| Expiry date | Oct 30, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C10/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for the simultaneous deposition of chromium and silicon to form a diffusion coating on a workpiece uses a halide-activated cementation pack with a dual halide activator. Elemental metal powders may be employed with the dual activator. A two-step heating schedule prevents blocking a chromium carbide from forming at the surface of the workpiece. Small contents of either Ce or V can be added to the Cr+Si contents of the coating by introducing oxides of Ce or V into the filler of the pack.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.