Method of making a wear component by plasma jet CVD
US5589232A · kind A · utility
11Cited by
17References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 19, 1994 |
| Grant date | Dec 31, 1996 |
| Priority date | — |
| Expiry date | Sep 19, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for making a wear component that includes providing a base surface, producing a synthetic diamond film by plasma jet CVD having at least a particular equivalent strain, and applying the diamond film to the base surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.